So, well, then it goes on.

I overlooked the two Cs.

Sorry for that.

Before we can

think about which CVD process

which form there is at the end

we should maybe first

talk about the CVD processes and what kind of CVD processes we know at all.

For that

I would just briefly talk about whether chemical vapor deposition can now be a process.

I would

just briefly collect four basic steps in general for CVD.

What do we start with

the CVD in general?

So what is our first step when we do chemical vapor deposition?

Any ideas?

So four steps are...

Exactly, we need gas.

So CVD, that means we need our precursor.

What do we have to do with the gas so that it reacts at all?

It has to be activated somehow.

Then we have a chemical reaction at the surface, that's why chemical vapor deposition.

And at the

end

of course

we want to have our reaction waste

which remains

to be washed out again.

So basically, every CVD process runs like this.

And then you have

learned five pieces in the lecture, five different CVD processes.

Does anyone like to

name one of them?

Yes.

So let's start with the low pressure CVD, that's not a comma,

but an L.

Exactly, the low pressure chemical vapor deposition.

We're supposed to name three

characteristics for it.

What is the biggest or most important feature?

What is the difference

between a normal CVD and a low pressure?

Yes, low pressure.

Exactly, so we have a low pressure,

less than 10 millibars.

And...

Exactly.

It would be important to throw in this context

also a feature.

What else do we have besides pressure?