Thin Film Processing (Part III) 2021/2022 /CoursesID:2926
- Most recent entry on 2022-02-10
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Organisational Unit

Professur für Nanostructured Particles

Recording type

Vorlesungsreihe

Via

Passwort

Language

Course chapters

Episode
Title
Lecturer
Updated
Via
Duration
Media
1
Introduction
Prof. Robin N. Klupp Taylor
2022-01-12
Passwort
00:13:53
Episode
Title
Lecturer
Updated
Via
Duration
Media
1
1.1 Physical vapour deposition (PVD): Introduction and basic features
Prof. Robin N. Klupp Taylor
2022-01-20
Passwort
00:14:51
2
1.1.1 PVD: Evaporation
Prof. Robin N. Klupp Taylor
2022-01-20
Passwort
00:14:56
3
1.1.2 PVD: Sputtering
Prof. Robin N. Klupp Taylor
2022-01-20
Passwort
00:13:02
4
1.1.3 PVD: Ion plating and laser ablation
Prof. Robin N. Klupp Taylor
2022-01-23
Passwort
00:28:48
5
1.2.1 CVD: Introduction
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:11:26
6
1.2.2 CVD: Basic theory
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:26:23
7
1.2.3.1 Implementation of CVD: Thermal CVD
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:10:28
8
1.2.3.2 Implementation of CVD: Stimulated CVD
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:17:35
9
1.2.3.3 Implementation of CVD: Precursors and delivery
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:13:58
Episode
Title
Lecturer
Updated
Via
Duration
Media
1
1. Electroplating
Prof. Robin N. Klupp Taylor
2022-02-10
Passwort
00:37:58
2
2. Electroless deposition
Prof. Robin N. Klupp Taylor
2022-02-10
Passwort
00:07:37
3
3. Sol-gel coating
Prof. Robin N. Klupp Taylor
2022-02-10
Passwort
00:25:59

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