Thin Film Processing (Part III) 2021/2022 /CoursesID:2926

These resources are password protected!

Detailed information

Most recent entry on 2022-02-10 

Organisational Unit

Professur für Nanostructured Particles

Recording type

Vorlesungsreihe

Via

Passwort

Language

English

Course chapters

Episode
Title
Lecturer
Updated
Via
Duration
Media
1
Introduction
Prof. Robin N. Klupp Taylor
2022-01-12
Passwort
00:13:53
Episode
Title
Lecturer
Updated
Via
Duration
Media
1
1.1 Physical vapour deposition (PVD): Introduction and basic features
Prof. Robin N. Klupp Taylor
2022-01-20
Passwort
00:14:51
2
1.1.1 PVD: Evaporation
Prof. Robin N. Klupp Taylor
2022-01-20
Passwort
00:14:56
3
1.1.2 PVD: Sputtering
Prof. Robin N. Klupp Taylor
2022-01-20
Passwort
00:13:02
4
1.1.3 PVD: Ion plating and laser ablation
Prof. Robin N. Klupp Taylor
2022-01-23
Passwort
00:28:48
5
1.2.1 CVD: Introduction
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:11:26
6
1.2.2 CVD: Basic theory
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:26:23
7
1.2.3.1 Implementation of CVD: Thermal CVD
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:10:28
8
1.2.3.2 Implementation of CVD: Stimulated CVD
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:17:35
9
1.2.3.3 Implementation of CVD: Precursors and delivery
Prof. Robin N. Klupp Taylor
2022-02-02
Passwort
00:13:58
Episode
Title
Lecturer
Updated
Via
Duration
Media
1
1. Electroplating
Prof. Robin N. Klupp Taylor
2022-02-10
Passwort
00:37:58
2
2. Electroless deposition
Prof. Robin N. Klupp Taylor
2022-02-10
Passwort
00:07:37
3
3. Sol-gel coating
Prof. Robin N. Klupp Taylor
2022-02-10
Passwort
00:25:59

More courses from Prof. Robin N. Klupp Taylor

Schloss1
Prof. Robin N. Klupp Taylor
lecture
2020-07-17
Free / IdM-login / Studon
Schloss1
Prof. Robin N. Klupp Taylor
lecture
2021-06-26
Passwort
Schloss1
Prof. Robin N. Klupp Taylor
lecture
2021-05-28
Passwort / Studon
Schloss1
Prof. Robin N. Klupp Taylor
lecture
2020-07-29
Studon
Schloss1
Prof. Robin N. Klupp Taylor
2022-05-05
Passwort / Studon